DocumentCode
619859
Title
Local model based KPLS with application to fault detection of batch process
Author
Hu Yi ; Ma Hehe ; Shi Hongbo
Author_Institution
Key Lab. of Adv. Control & Optimization for Chem. Processes of Minist. of Educ., East China Univ. of Sci. & Technol., Shanghai, China
fYear
2013
fDate
25-27 May 2013
Firstpage
1097
Lastpage
1103
Abstract
To handle the problems of nonlinearity, dynamic and multiphase in batch processes, a novel online modeling and monitoring method based on local model and kernel partial least squares (KPLS) is proposed. The improved local modeling method not only utilizes the information of the current time slice, but also incorporates the information of the nearby time slices. The local model can reflect the changes of operating process, so it can be used to monitor processes with time-varying behavior and operating phase change. Besides, KPLS is employed to model the nonlinear information of the process. A case study of the semiconductor process illustrated that the proposed approach can effectively monitor the batch process.
Keywords
batch processing (industrial); least squares approximations; process monitoring; batch process; fault detection; kernel partial least squares; local model Based KPLS; process monitoring; semiconductor process; time slice; Batch production systems; Electronic mail; Fault detection; Kernel; Monitoring; Semiconductor device modeling; Semiconductor process modeling; Batch Process; Fault Detection; Kernel Partial Least Squares; Local Model;
fLanguage
English
Publisher
ieee
Conference_Titel
Control and Decision Conference (CCDC), 2013 25th Chinese
Conference_Location
Guiyang
Print_ISBN
978-1-4673-5533-9
Type
conf
DOI
10.1109/CCDC.2013.6561088
Filename
6561088
Link To Document