Title :
Local model based KPLS with application to fault detection of batch process
Author :
Hu Yi ; Ma Hehe ; Shi Hongbo
Author_Institution :
Key Lab. of Adv. Control & Optimization for Chem. Processes of Minist. of Educ., East China Univ. of Sci. & Technol., Shanghai, China
Abstract :
To handle the problems of nonlinearity, dynamic and multiphase in batch processes, a novel online modeling and monitoring method based on local model and kernel partial least squares (KPLS) is proposed. The improved local modeling method not only utilizes the information of the current time slice, but also incorporates the information of the nearby time slices. The local model can reflect the changes of operating process, so it can be used to monitor processes with time-varying behavior and operating phase change. Besides, KPLS is employed to model the nonlinear information of the process. A case study of the semiconductor process illustrated that the proposed approach can effectively monitor the batch process.
Keywords :
batch processing (industrial); least squares approximations; process monitoring; batch process; fault detection; kernel partial least squares; local model Based KPLS; process monitoring; semiconductor process; time slice; Batch production systems; Electronic mail; Fault detection; Kernel; Monitoring; Semiconductor device modeling; Semiconductor process modeling; Batch Process; Fault Detection; Kernel Partial Least Squares; Local Model;
Conference_Titel :
Control and Decision Conference (CCDC), 2013 25th Chinese
Conference_Location :
Guiyang
Print_ISBN :
978-1-4673-5533-9
DOI :
10.1109/CCDC.2013.6561088