DocumentCode :
620679
Title :
Analysis on electromechanical coupling coefficients in AlN-based bulk acoustic wave resonators based on first-principle calculations
Author :
Yokoyama, Tomoki ; Iwazaki, Yoshiki ; Nishihara, Tokihiro ; Ueda, Makoto
Author_Institution :
TAIYO YUDEN Co., Ltd., Akashi, Japan
fYear :
2012
fDate :
7-10 Oct. 2012
Firstpage :
551
Lastpage :
554
Abstract :
We discuss the effect of aluminum nitride (AlN) film stress on the electromechanical coupling coefficient (k2) of film bulk acoustic resonators (FBAR) based on first-principle calculations and experiments. Our calculations indicate that the compressive stress of AlN film induces the expansion of the c-axis lattice constant and affected the piezoelectric constant of AlN. We found that the piezoelectric constant of AlN and k2 of FBAR estimated using first-principle calculation increase with decreasing compressive stress of AlN films. We also confirmed from experiments that the piezoelectric constant increased from 6.5 to 7.1pC/N due to the decrease in compressive stress. Finally, we fabricated air-gap type FBAR that have different AlN film stresses. As a result, k2 improved from 6.0 to 6.5% by controlling the film stress from -1200 to 0MPa.
Keywords :
acoustic resonators; air gaps; aluminium compounds; bulk acoustic wave devices; internal stresses; piezoelectric thin films; AlN; air-gap type FBAR; bulk acoustic wave resonators; c-axis lattice constant; compressive stress; electromechanical coupling coefficients; film bulk acoustic resonators; film stress; piezoelectric constant; Couplings; Film bulk acoustic resonators; Films; III-V semiconductor materials; Lattices; Residual stresses;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ultrasonics Symposium (IUS), 2012 IEEE International
Conference_Location :
Dresden
ISSN :
1948-5719
Print_ISBN :
978-1-4673-4561-3
Type :
conf
DOI :
10.1109/ULTSYM.2012.0137
Filename :
6561923
Link To Document :
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