DocumentCode :
620929
Title :
On the lateral excitation of shear modes in AlN layered resonators
Author :
Clement, M. ; Iborra, E. ; Olivares, J. ; de Miguel-Ramos, M. ; Capilla, J. ; Sangrador, J.
Author_Institution :
GMME.-CEMDATIC. ETSI Telecomun., Univ. Politec. de Madrid, Madrid, Spain
fYear :
2012
fDate :
7-10 Oct. 2012
Firstpage :
1
Lastpage :
4
Abstract :
In this paper we describe the fabrication and frequency characterization of different structures intended for the lateral excitation of shear modes in AlN c-axis-oriented films, which are at the same time designed to minimize the excitation of longitudinal modes. Laterally excited resonators were built on partially metallic (SiO2, W) and insulating (SiOC, Si3N4) acoustic mirrors built on silicon substrates, and on insulating mirrors (SiO2, TaOx) built on insulating glass plates. TiOx seed layers were used to stimulate the growth of highly c-axis oriented AlN films, which was confirmed by XRD and SAW measurements. Coplanar Mo electrodes of different geometries were defined on top of the AlN films to excite the shear modes. All the structures analyzed displayed a clear longitudinal mode, corresponding to an acoustic velocity of 11000 m/s, but a null or extremely weak shear response corresponding to a sound velocity of around 6350 m/s. The simulation of the frequency response based on Mason´s model confirms that the shear resonance is extremely weak. The observed longitudinal modes are attributed either to the field applied between the electrodes and a conductive plane (metallic layer or Si substrate) or to the electric field parallel to the c-axis in the edges of the electrodes or in tilted grains. The low excitation of shear modes is attributed to the very low values of electric field strength parallel to the surface.
Keywords :
III-V semiconductors; X-ray diffraction; acoustic wave velocity; aluminium compounds; conducting materials; frequency response; insulating materials; mirrors; molybdenum; semiconductor thin films; silicon compounds; surface acoustic wave resonators; tantalum compounds; titanium compounds; tungsten; wide band gap semiconductors; AlN; Mason model; Mo; SAW; Si; Si substrate; Si3N4; SiO2; SiOC; TaOx; TiO2; W; XRD; acoustic velocity; c-axis-oriented films; conductive plane; coplanar electrodes; frequency characterization; frequency response; geometries; insulating acoustic mirror; insulating glass plates; lateral excitation; laterally excited resonators; longitudinal modes; metallic layer; minimization; parallel electric field strength; partially metallic acoustic mirror; seed layers; shear modes; shear resonance; shear response; silicon substrates; sound velocity; tilted grains; velocity 11000 m/s; Acoustics; Electric fields; Electrodes; Films; Frequency response; III-V semiconductor materials; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ultrasonics Symposium (IUS), 2012 IEEE International
Conference_Location :
Dresden
ISSN :
1948-5719
Print_ISBN :
978-1-4673-4561-3
Type :
conf
DOI :
10.1109/ULTSYM.2012.0133
Filename :
6562418
Link To Document :
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