DocumentCode
621257
Title
Process variation-tolerant 3D microprocessor design: An efficient architectural solution
Author
Joonho Kong ; Sung Woo Chung
Author_Institution
Dept. of Electr. & Comput. Eng., Rice Univ., Houston, TX, USA
fYear
2013
fDate
29-31 May 2013
Firstpage
45
Lastpage
48
Abstract
Process variation is one of the most challenging problems for 3D microprocessors. This is because stacked dies are likely to have fairly different characteristics due to wafer-to-wafer (W2W) variations, which may severely hurt yield of 3D microprocessors. In this paper, we introduce a process variation-tolerant 3D microprocessor design that exploits an architectural insight: narrow-width values. The main target of our technique is last-level caches (LLCs), which are composed of several dies. By storing only the meaningful bit parts within a data word into the LLCs while discarding the zero bit parts (which can be recovered by the zero-extension logic), our proposed technique improves a storage efficiency of the LLCs, which eventually enhances cache yield. According to our evaluation results, our technique significantly improves cache yield in a performance-/energy-efficient manner.
Keywords
cache storage; integrated circuit design; integrated circuit yield; microprocessor chips; 3D microprocessor yield; LLC; W2W variations; cache yield; energy efficiency; last-level caches; narrow-width values; performance efficiency; process variation-tolerant 3D microprocessor design; stacked dies; storage efficiency; wafer-to-wafer variations; zero bit parts; zero-extension logic; Arrays; Microprocessors; Process control; Registers; SRAM cells; Terminology; 3D microprocessor; last-level cache; narrowwidth value; process variation; yield;
fLanguage
English
Publisher
ieee
Conference_Titel
IC Design & Technology (ICICDT), 2013 International Conference on
Conference_Location
Pavia
Print_ISBN
978-1-4673-4740-2
Electronic_ISBN
978-1-4673-4741-9
Type
conf
DOI
10.1109/ICICDT.2013.6563300
Filename
6563300
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