• DocumentCode
    62495
  • Title

    MgO-Based Double Barrier Magnetic Tunnel Junctions With Synthetic Antiferromagnetic Free Layer

  • Author

    Dalai Li ; Jiafeng Feng ; Guoqiang Yu ; Hongxiang Wei ; Xiufeng Han ; Coey, J.M.D.

  • Author_Institution
    Beijing Nat. Lab. of Condensed Matter Phys., Inst. of Phys., Beijing, China
  • Volume
    49
  • Issue
    10
  • fYear
    2013
  • fDate
    Oct. 2013
  • Firstpage
    5204
  • Lastpage
    5207
  • Abstract
    CoFeB/Ru/CoFeB has been used as the middle free layer in MgO-based double barrier magnetic tunnel junctions (DBMTJs). The tunneling magnetoresistance (TMR) ratio, V1/2 (bias voltage at half maximum TMR ratio) and Vout (output voltage, defined as V multiplied by TMR ratio) have been investigated as a function of annealing temperature (Ta) and Ru thickness (tRu) in the free layer. Magnetization data reveal that the two CoFeB layers in CoFeB/Ru/CoFeB are antiferromagnetically coupled. Compared with V1/2 of only 0.31 V for single barrier MTJs (SBMTJs) annealed at 375°C, V1/2 for DBMTJs is up to 0.66 V. By increasing Ta, TMR ratio first increases, reaching the highest critical value, and then decreases. The highest TMR ratio is 181% with tRu= 0.6 nm, which is much higher than that obtained in the DBMTJs with the pure CoFeB as the free layer. The improved TMR ratio is mainly due to the relatively thorough crystallization of the CoFeB layers in the free layer. The thermal annealing has been proven to be an effective method to remove the dissimilarity of the top and bottom CoFeB/MgO interfaces. Vout in the positive and negative voltage branches follows the same trend as that of TMR ratio with Ta.
  • Keywords
    annealing; antiferromagnetic materials; boron alloys; cobalt alloys; crystallisation; iron alloys; magnesium compounds; magnetic multilayers; magnetisation; ruthenium; tunnelling magnetoresistance; DBMTJ; MgO-CoFeB-Ru-CoFeB; annealing temperature; antiferromagnetic coupling; bias voltage; critical value; crystallization; double barrier magnetic tunnel junctions; half maximum TMR ratio; magnetization; middle free layer; negative voltage branch; output voltage; positive voltage branch; synthetic antiferromagnetic free layer; temperature 375 degC; thermal annealing; tunneling magnetoresistance; Bias voltage at half maximum TMR ratio $V_{1/2}$ ; DBMTJs; TMR ratio; output voltage $V_{rm out}$;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.2013.2263286
  • Filename
    6516566