Title :
Analysis, design and implementation of mm-Wave SiGe stacked Class-E power amplifiers
Author :
Datta, Kanak ; Roderick, Jonathan ; Hashemi, Hossein
Author_Institution :
Electr. Eng.-Electrophys., Univ. of Southern California, Los Angeles, CA, USA
Abstract :
Design equations and performance limits of stacked Class-E power amplifiers at mm-waves, including the limitations imposed by device parasitics, are presented in this paper. As a proof of concept of this parasitic aware mm-wave Class-E design methodology and to demonstrate the beyond BVCEO Class-E operation in a stacked architecture at mm-wave frequencies, a Q-band, single ended, two-stage, double-stacked, Class-E power amplifier is designed in a 0.13 μm SiGe HBT BiCMOS process. The measured performance of the fabricated chip show 23.4 dBm maximum output power at 34.9% peak power added efficiency (PAE), and 14.6 dB of power gain across 5 GHz centered around 41 GHz for a supply voltage of 4 V. The total chip area including the pads is 0.8 mm × 1.28 mm.
Keywords :
BiCMOS analogue integrated circuits; Ge-Si alloys; millimetre wave power amplifiers; power amplifiers; BVCEO Class-E operation; HBT BiCMOS process; Q-band power amplifier; SiGe; design equation; double-stacked power amplifier; frequency 41 GHz; frequency 5 GHz; gain 14.6 dB; mm-wave frequencies; mm-wave stacked class-E power amplifiers; parasitic aware mm-wave Class-E design methodology; power gain; single ended power amplifier; size 0.13 mum; two-stage power amplifier; voltage 4 V; Capacitance; Heterojunction bipolar transistors; Power generation; Power measurement; Silicon germanium; Switches; BVCEO; Class-E; Power Amplifier (PA); Q-band; millimeter-wave; silicon germanium (SiGe) HBT;
Conference_Titel :
Radio Frequency Integrated Circuits Symposium (RFIC), 2013 IEEE
Conference_Location :
Seattle, WA
Print_ISBN :
978-1-4673-6059-3
DOI :
10.1109/RFIC.2013.6569581