• DocumentCode
    62578
  • Title

    Theoretical Model of Plasma Metallization of Ceramic Heat Sinks

  • Author

    Vysikaylo, Philipp I. ; Mitin, Valeriy S. ; Mitin, Aleksey V. ; Krasnobaev, Nikolay N. ; Belyaev, Victor V.

  • Author_Institution
    Plasma Chem. Lab., Moscow Radiotechnical Inst., Moscow, Russia
  • Volume
    43
  • Issue
    3
  • fYear
    2015
  • fDate
    Mar-15
  • Firstpage
    892
  • Lastpage
    895
  • Abstract
    This paper reports a theoretical study of the mechanism of adhesion of a plasma metal coating to a ceramic substrate by an example of beryllium oxide. The adhesion mechanism is based on an increase in the concentration of structural defects (vacancies) and electron exchange interaction of a metal-beryllium oxide pair during the plasma thermal activation of the process. The proposed analysis of the substrate boundary conditions on an example of titanium atoms and beryllium oxide justifies the optimal regime of the coating deposition in plasma (heating temperature, deposition time, and activation energy) with the maximum adhesion of the plasma metal coating. It is in good agreement with the experimental studies. According to the analytical calculations, the substrate temperature for an ideal surface as well as the maximum adhesion of the plasma metal coating is 1230 K in the case of beryllium oxide, whereas the experimental temperature is about 1380 K.
  • Keywords
    adhesion; beryllium compounds; ceramics; exchange interactions (electron); heat sinks; metallic thin films; plasma deposited coatings; plasma deposition; vacancies (crystal); BeO; activation energy; analytical calculations; ceramic heat sinks; ceramic substrate; deposition time; electron exchange interaction; heating temperature; maximum adhesion; metal-beryllium oxide pair; optimal coating deposition regime; plasma metal coating; plasma metallization model; plasma thermal activation; structural defect concentration; substrate boundary condition analysis; substrate temperature; temperature 1230 K; vacancies; Adhesives; Ceramics; Coatings; Metals; Plasmas; Substrates; Surface treatment; High-power microwave devices; mechanism and kinetics of adhesion formation; plasma chemical reaction; plasma metal coating; power layer; vacancy diffusion; vacancy diffusion.;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2015.2395871
  • Filename
    7039247