Multi-source, complex beamline model development in MICHELLE eBEAM

Simulations of modern, high current electron beam lithography devices may require modeling of optical components and multiple electron sources that are positioned in an oblique fashion with respect to the main device axis and include counter streaming regions, where two beams are co-located in space while propagating in opposite directions. Modeling such complex multi-beam systems presents different computational challenges depending on the specific device and regime being modeled. Applications of interest require in some cases the model of both global and stochastic space charge, where the latter requires direct evaluation of Coulomb interactions. A new approach implemented in MICHELLE-eBEAM is designed to take advantage of the GPU hardware acceleration and novel algorithms to efficiently capture particle dynamics for complex beamlines. In this paper we report on our latest progress and show for a high current electron beam lithography application the achieved accuracy and performance of the new code.