The Effects of mass load on cathode etching and Hydrogen (H) consumption during the impregnation process

Author

Connor, Derrick ; Faulkner, Susan

Author_Institution

Semicon Assoc., Lexington, KY, USA

fYear

2013

fDate

21-23 May 2013

Firstpage

1

Lastpage

2

Abstract

Semicon Associates is a world-class producer of dispenser cathodes for traveling wave tubes, cathode ray tubes, ion lasers and space qualified cathode assemblies. The research objective is to allow Semicon Associates to determine the effects of mass load on cathode etching and Hydrogen (H) gas consumption during the impregnation process. Hydrogen (H) is a chemical element with symbol H, atomic number 1 and a molecular formula of H₂. Hydrogen is naturally occurring and is rare on Earth because it readily forms covalent compounds with most elements.

Keywords

cathode-ray tubes; cathodes; etching; hydrogen; ion lasers; travelling wave tubes; Earth; H; Semicon Associates; cathode etching; cathode ray tubes; covalent compounds; dispenser cathodes; hydrogen gas consumption; impregnation process; ion lasers; mass load effect; space qualified cathode assemblies; traveling wave tubes; Cathodes; Drives; Etching; Furnaces; Hydrogen; Temperature measurement; Dew Point; Hydrogen (H); Impregnation; Mass flow analysis;

fLanguage

English

Publisher

ieee

Conference_Titel

Vacuum Electronics Conference (IVEC), 2013 IEEE 14th International

Conference_Location

Paris

Print_ISBN

978-1-4673-5976-4

Type

conf

DOI

10.1109/IVEC.2013.6571145

Filename

6571145