Title :
The Effects of mass load on cathode etching and Hydrogen (H) consumption during the impregnation process
Author :
Connor, Derrick ; Faulkner, Susan
Author_Institution :
Semicon Assoc., Lexington, KY, USA
Abstract :
Semicon Associates is a world-class producer of dispenser cathodes for traveling wave tubes, cathode ray tubes, ion lasers and space qualified cathode assemblies. The research objective is to allow Semicon Associates to determine the effects of mass load on cathode etching and Hydrogen (H) gas consumption during the impregnation process. Hydrogen (H) is a chemical element with symbol H, atomic number 1 and a molecular formula of H2. Hydrogen is naturally occurring and is rare on Earth because it readily forms covalent compounds with most elements.
Keywords :
cathode-ray tubes; cathodes; etching; hydrogen; ion lasers; travelling wave tubes; Earth; H; Semicon Associates; cathode etching; cathode ray tubes; covalent compounds; dispenser cathodes; hydrogen gas consumption; impregnation process; ion lasers; mass load effect; space qualified cathode assemblies; traveling wave tubes; Cathodes; Drives; Etching; Furnaces; Hydrogen; Temperature measurement; Dew Point; Hydrogen (H); Impregnation; Mass flow analysis;
Conference_Titel :
Vacuum Electronics Conference (IVEC), 2013 IEEE 14th International
Conference_Location :
Paris
Print_ISBN :
978-1-4673-5976-4
DOI :
10.1109/IVEC.2013.6571145
