• DocumentCode
    628398
  • Title

    Interposer technology for high band width interconnect applications

  • Author

    Detalle, Mikael ; La Manna, A. ; De Vos, J. ; Nolmans, P. ; Daily, R. ; Civale, Y. ; Beyer, G. ; Beyne, Eric

  • Author_Institution
    Imec, Leuven, Belgium
  • fYear
    2013
  • fDate
    28-31 May 2013
  • Firstpage
    323
  • Lastpage
    328
  • Abstract
    Silicon Interposer provides very high density interconnect combining through Silicon vias and fine wiring. The concept reported in this paper is implementing integrated power supply layers with decoupling metal insulator metal decoupling capacitor to enhance signal integrity. In addition an upscale damascene process was used to fabricate high density and high bandwidth routing interconnect. A detailed characterization of the warpage behavior along the processing steps and electrical characterization of interposer TSV and BEOL are reported.
  • Keywords
    capacitors; integrated circuit interconnections; network routing; signal processing; three-dimensional integrated circuits; BEOL; TSV; damascene back end of line technology; decoupling metal insulator metal decoupling capacitor; electrical characterization; fine wiring; high bandwidth routing interconnect; integrated power supply layers; interposer technology; processing steps; signal integrity enhancement; through silicon vias; upscale damascene process; warpage behavior; Capacitance; Capacitors; Electrodes; Insulators; Metals; Silicon; Through-silicon vias;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Components and Technology Conference (ECTC), 2013 IEEE 63rd
  • Conference_Location
    Las Vegas, NV
  • ISSN
    0569-5503
  • Print_ISBN
    978-1-4799-0233-0
  • Type

    conf

  • DOI
    10.1109/ECTC.2013.6575590
  • Filename
    6575590