DocumentCode :
628446
Title :
Design for reliability of multi-layer thin film stretchable interconnects
Author :
Yung-Yu Hsu ; Lucas, Kevin ; Davis, Daniel ; Ghaffari, Roozbeh ; Elolampi, Brian ; Dalal, M. ; Work, John ; Lee, Sang-Rim ; Rafferty, Conor ; Dowling, K.
Author_Institution :
MC10 Inc., Cambridge, MA, USA
fYear :
2013
fDate :
28-31 May 2013
Firstpage :
623
Lastpage :
628
Abstract :
To date, nearly all electronic systems have been rigid and inflexible. However, there are many areas such as in biomedical devices in which these rigid electronics are less than ideal and which require new conformable electronic systems. In order to create effective, compact, and complex systems, stretchable interconnects must be designed to overlap one another in multiple layers. The circular strain relief structure described in this paper effectively redistributes the strain to the crest of the horseshoes of the interconnects themselves. Numerical analysis and simulations of the strain relief structures described in this paper indicate that the structures will function indefinitely when stretched up to a 20% elongation. In-situ electromechanical measurements show that the structures are able to withstand elongations of 285% or more before failing. Precise failure mechanisms including straightening of the interconnects and micro-crack formation are documented with images taken during the electromechanical tests.
Keywords :
biomedical electronics; elongation; interconnections; numerical analysis; semiconductor device reliability; biomedical devices; circular strain relief structure; complex systems; conformable electronic systems; electromechanical testing; elongations; in-situ electromechanical measurements; microcrack formation; multilayer thin film stretchable interconnection reliability design; numerical analysis; rigid electronics; stretchable interconnection; Gold; Junctions; Plastics; Resistance; Strain; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Components and Technology Conference (ECTC), 2013 IEEE 63rd
Conference_Location :
Las Vegas, NV
ISSN :
0569-5503
Print_ISBN :
978-1-4799-0233-0
Type :
conf
DOI :
10.1109/ECTC.2013.6575638
Filename :
6575638
Link To Document :
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