• DocumentCode
    628468
  • Title

    Novel surface modification of nanosilica for low stress underfill

  • Author

    Ziyin Lin ; Yan Liu ; Kyoung-sik Moon ; Wong, C.P.

  • Author_Institution
    Sch. of Mater. Sci. & Eng., Georgia Inst. of Technol., Atlanta, GA, USA
  • fYear
    2013
  • fDate
    28-31 May 2013
  • Firstpage
    773
  • Lastpage
    777
  • Abstract
    We report a novel surface modification method to improve the interfacial bonding and compatibility of nanosilica with epoxy matrix. This approach utilized a two-layer modification strategy that not only provides a layer of functional groups at the surface to match the surface energy of nanosilica with epoxy resin, but also generates a large filler-matrix interphase transition region by covalent bonding that enables more efficient CTE reduction. It is found that dispersion of nanosilica is dramatically improved compared to untreated particles. The CTE of nanocomposites containing two-layer modified nanosilica is a 5-15 ppm/K lower than those filled with conventionally modified nanosilica at the similar loadings. Additionally, the nanocomposites developed in this study do not show significant Tg reduction. These results show that our surface modification method is very promising in developing novel nanosilica-based underfills.
  • Keywords
    adhesive bonding; integrated circuit packaging; nanocomposites; resins; silicon compounds; surface treatment; thermal expansion; three-dimensional integrated circuits; CTE reduction; SiO2; coefficient of thermal expansion; covalent bonding; epoxy matrix; epoxy resin; filler matrix interphase transition region; functional group; interfacial bonding; low stress underfill; surface energy; surface modification; two-layer modification strategy; Atmospheric measurements; Bonding; Nanocomposites; Polymers; Silicon compounds; Stress; Surface treatment;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Components and Technology Conference (ECTC), 2013 IEEE 63rd
  • Conference_Location
    Las Vegas, NV
  • ISSN
    0569-5503
  • Print_ISBN
    978-1-4799-0233-0
  • Type

    conf

  • DOI
    10.1109/ECTC.2013.6575660
  • Filename
    6575660