Title :
Yield and reliability in 3D interconnect and WLP — Ultra thin chip stacking
Author :
Luesebrink, Helge ; Pares, G. ; Attard, A. ; Schnegg, F. ; Klug, G.
Author_Institution :
PVA Tepla AG Plasma Syst. Bus. Unit, Kirchheim, Germany
Abstract :
This paper discusses the preconditions of thinned wafer with plasma back side stress relief (BSR) and chip side healing (CSH) processes applied in order to improve die strength allowing for stacking via pick and place preventing yield loss due to die cracking. As wafer thinning and singulating (dicing) leave scattered process marks (kerfs, chipping, micro cracks) on the chip, the thin die is prone to cracking when released from the wafer tape during a pick and place process.
Keywords :
integrated circuit interconnections; integrated circuit reliability; microassembling; microcracks; 3D interconnect; BSR; CSH; WLP; chip side healing; die cracking; die strength; microcracks; plasma back side stress relief; reliability; thinned wafer; ultra thin chip stacking; wafer tape; wafer thinning; Face; Plasmas; Reliability; Silicon; Stacking; Stress; Surface treatment;
Conference_Titel :
Electronic Components and Technology Conference (ECTC), 2013 IEEE 63rd
Conference_Location :
Las Vegas, NV
Print_ISBN :
978-1-4799-0233-0
DOI :
10.1109/ECTC.2013.6575684