DocumentCode
628510
Title
Electrochemical assembly of SAM on copper for epoxy/copper adhesion improvement
Author
Kwok, Stephen C. T. ; Yuen, M.M.F.
Author_Institution
Dept. of Mech. Eng., Hong Kong Univ. of Sci. & Technol., Kowloon, China
fYear
2013
fDate
28-31 May 2013
Firstpage
1048
Lastpage
1053
Abstract
This paper reports on adhesion enhancement effects of self-assembled organothiol treatment on copper/epoxy interface, as well as a significant reduction in treatment time by the electrochemical assembly approach. Interfacial adhesion strength between copper/epoxy interfaces was studied against different treatment time under the influence of electrical potential. A maximum 20-fold enhancement was demonstrated through improved chemical linkage formed between copper substrate and epoxy layer. The treatment time was also reduced by 32 times to 1800s with the proposed preparation method. Electrochemical characterization including electrochemical impedance spectroscopy (EIS) was carried out in this work. Results were correlated with adhesion enhancement effect by organothiol self-assembly monolayer (SAM). The double layer capacitance model was used to explain how molecular film formation process affects adhesion results between Cu/epoxy interfaces.
Keywords
adhesion; assembling; copper; monolayers; Cu; EIS; SAM; adhesion enhancement effects; chemical linkage; electrical potential; electrochemical assembly approach; electrochemical characterization; electrochemical impedance spectroscopy; epoxy-copper adhesion improvement; interfacial adhesion strength; molecular film formation process; preparation method; self-assembled organothiol treatment; Adhesives; Copper; Electric potential; Market research; Substrates; Surface impedance; Surface treatment;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Components and Technology Conference (ECTC), 2013 IEEE 63rd
Conference_Location
Las Vegas, NV
ISSN
0569-5503
Print_ISBN
978-1-4799-0233-0
Type
conf
DOI
10.1109/ECTC.2013.6575702
Filename
6575702
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