• DocumentCode
    628622
  • Title

    Strength of solid-state silver bonding between copper

  • Author

    Yi-Ling Chen ; Lee, C.C.

  • Author_Institution
    Electr. Eng. & Comput. Sci., Mater. & Manuf. Technol., Univ. of California, Irvine, Irvine, CA, USA
  • fYear
    2013
  • fDate
    28-31 May 2013
  • Firstpage
    1773
  • Lastpage
    1776
  • Abstract
    In this Project, we designed and set up an experiment to measure the bonding strength. Silver (Ag) layer is used as a bonding medium between copper (Cu). The upper Cu is called Cu chip and the lower Cu is Cu substrate. Both Copper (Cu) and silver (Ag) are ductile metal with very excellent electrical and thermal conductivity. Samples with structure of Cu/Ag/Cu are manufactured using solid-state bonding process at 300°C. The Cu substrates are electroplated with 50μm Ag layer. The Cu chip and substrate are held and pressed together with 1000 psi static pressure. This is a solid-state process without any molten phase involved. Scanning electron microscopy (SEM) is used to examine the quality of Ag joints, the Cu-Ag interfaces, and the microstructure. Its images demonstrate that Cu chip is well bonded to the Ag layer on Cu substrate. Six samples went through shear test to determine the joint strength. They all pass the MIL-STD-883G standard.
  • Keywords
    bonding processes; copper alloys; electrical conductivity; scanning electron microscopy; silver alloys; thermal conductivity; MIL-STD-883G standard; SEM; bonding strength measurement; copper; ductile metal; electrical conductivity; scanning electron microscopy; shear test; silver layer; solid-state silver bonding process; temperature 300 degC; thermal conductivity; Bonding; Microstructure; Scanning electron microscopy; Silver; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Components and Technology Conference (ECTC), 2013 IEEE 63rd
  • Conference_Location
    Las Vegas, NV
  • ISSN
    0569-5503
  • Print_ISBN
    978-1-4799-0233-0
  • Type

    conf

  • DOI
    10.1109/ECTC.2013.6575815
  • Filename
    6575815