• DocumentCode
    628628
  • Title

    Noise coupling of through-via in silicon and glass interposer

  • Author

    Manho Lee ; Jonghyun Cho ; Joohee Kim ; Joungho Kim ; Jiseong Kim

  • Author_Institution
    Dept. of Electr. Eng., Korea Adv. Inst. of Sci. & Technol. (KAIST), Daejeon, South Korea
  • fYear
    2013
  • fDate
    28-31 May 2013
  • Firstpage
    1806
  • Lastpage
    1810
  • Abstract
    The noise coupling between signal through-vias of silicon-based interposer and glass-based interposer are compared by simulating in both frequency and time domain. In addition to noise coupling, through-via´s S21 in both interposers is also simulated and compared. To obtain reasonable data, all dimension parameters are chosen based on existing recent technology and material properties are also chosen based on further chip manufacturing. With these simulations, it is observed that the glass interposer shows better noise blocking performance, and some important features between silicon and glass interposer are qualitatively explained through previous through-via model.
  • Keywords
    elemental semiconductors; glass; integrated circuit modelling; integrated circuit noise; silicon; three-dimensional integrated circuits; Si; chip manufacturing; frequency domain simulation; glass interposer; material properties; noise coupling; silicon interposer; through-via model; time domain simulation; Couplings; Frequency-domain analysis; Glass; Noise; Silicon; Substrates; Through-silicon vias;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Components and Technology Conference (ECTC), 2013 IEEE 63rd
  • Conference_Location
    Las Vegas, NV
  • ISSN
    0569-5503
  • Print_ISBN
    978-1-4799-0233-0
  • Type

    conf

  • DOI
    10.1109/ECTC.2013.6575821
  • Filename
    6575821