DocumentCode :
629132
Title :
A 210mV 7.3MHz 8T SRAM with dual data-aware write-assists and negative read wordline for high cell-stability, speed and area-efficiency
Author :
Chien-Fu Chen ; Ting-Hao Chang ; Lai-Fu Chen ; Meng-Fan Chang ; Yamauchi, Hiroyuki
Author_Institution :
Nat. Tsing Hua Univ., Hsinchu, Taiwan
fYear :
2013
fDate :
11-13 June 2013
Abstract :
This work proposes an 8T cell with dual data-aware write-assist (D2AW) and negative read-WL (NRWL) schemes to increase the figure of merit (FOM): [cell stability (CS)*cycle frequency (f)]/[cell area (A)*minimum VDD (VDDmin)]. The column-based D2AW provides, for the first time, the solution to the trade-off between the row/column half-select (HS)-CS margins and the write margin (WM) thanks to the dual data-aware controls of: 1) cell-VSS (DA-CVSS) and 2) write-wordline (DA-WWL). NRWL expands the RBL voltage swing (VRBLS), while accelerating BL developing time (TBLS). A fabricated 65nm 128-row 16Kb D2AW8T SRAM achieved 7.3MHz/48MHz at VDD=210mV/300mV. The resulting “CS*f/(A*VDDmin)” is 14+x higher than that of other low-VDDmin SRAM cells.
Keywords :
SRAM chips; circuit stability; 8T cell; D2AW8T SRAM cells; DA-CVSS; DA-WWL; FOM; HS-CS margin; NRWL scheme; RBL voltage swing; WM; area efficiency; bit rate 16 kbit/s; cell area; cell stability; cell-VSS; column-based D2AW; cycle frequency; data-aware control; dual data-aware write-assist; figure of merit; frequency 7.3 MHz; negative read wordline; negative read-WL; row-column half-select margin; size 65 nm; voltage 210 mV; write margin; write-wordline; Arrays; Degradation; Educational institutions; Layout; Random access memory; Thermal stability; Very large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology (VLSIT), 2013 Symposium on
Conference_Location :
Kyoto
ISSN :
0743-1562
Print_ISBN :
978-1-4673-5226-0
Type :
conf
Filename :
6576631
Link To Document :
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