DocumentCode :
630205
Title :
Electron mobility variance in the presence of an electric field
Author :
Melkonyan, S.V. ; Surmalyan, Ash V. ; Asriyan, H.V. ; Harutyunyan, A.L.
Author_Institution :
Dept. of Semicond. Phys. & Microelectron., Yerevan State Univ., Yerevan, Armenia
fYear :
2013
fDate :
24-28 June 2013
Firstpage :
1
Lastpage :
4
Abstract :
The influence of an external uniform electric field on electron mobility variance in non-degenerate n-type semiconductor is discussed. Analyzing the result of mobility fluctuation theory, according to which electron mobility variance in equilibrium semiconductor equals infinity, it is shown that in the presence of uniform electric field mobility variance becomes finite. The effect is explained in terms of the so-called electron-phonon FIT (field-induced tunnel) scattering. The results of numerical calculations of mobility variance dependence on electric field are presented for silicon and germanium. It is revealed that mobility variance decreases with the electric field increase by logarithmic law.
Keywords :
electric field effects; electron mobility; elemental semiconductors; germanium; numerical analysis; silicon; Ge; Si; electron mobility variance; electron-phonon field-induced tunnel scattering; external uniform electric field; logarithmic law; mobility fluctuation theory; nondegenerate n-type semiconductor; numerical calculations; uniform electric field mobility variance; Electric fields; Electron mobility; Fluctuations; Noise; Optical scattering; Phonons; electron mobility; fluctuation; lattice scattering; semiconductor; variance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Noise and Fluctuations (ICNF), 2013 22nd International Conference on
Conference_Location :
Montpellier
Print_ISBN :
978-1-4799-0668-0
Type :
conf
DOI :
10.1109/ICNF.2013.6578972
Filename :
6578972
Link To Document :
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