Title :
Applications of control systems and optimization in the design of semiconductor capital equipment
Author :
Ummethala, Upendra ; Hench, John J. ; van Lievenoogen, Anne ; Subrahmanyan, Pradeep
Author_Institution :
KLA-Tencor Corp., Milpitas, CA, USA
Abstract :
This tutorial presents several examples of high performance control systems in the Semiconductor equipment industry. Examples include technologies used in lithography and mask inspection.
Keywords :
control systems; design engineering; inspection; lithography; manufacturing processes; masks; optimisation; production equipment; semiconductor industry; control systems; lithography technology; mask inspection technology; optimization; semiconductor capital equipment design; semiconductor equipment industry; Actuators; Adaptive optics; Electron beams; Lithography; Mirrors; Optical interferometry; Optical sensors;
Conference_Titel :
American Control Conference (ACC), 2013
Conference_Location :
Washington, DC
Print_ISBN :
978-1-4799-0177-7
DOI :
10.1109/ACC.2013.6580661
