Title :
Constrained optimization of rotating magnetron in low-pressure plasma sputtering
Author_Institution :
NT-MDT Dev., Tempe, AZ, USA
Abstract :
Linear constrained optimization models have been applied to improve the design of a rotating magnetron for a Physical Vapor Deposition (PVD) system based on glow discharge plasma. These models have a number of advantages, including flexibility of describing technological requirements by linear inequalities. An interactive software system based on these models has been used in several PVD designs.
Keywords :
CAD; constraint handling; electrical engineering computing; linear programming; magnetrons; plasma deposition; sputter deposition; vacuum deposition; PVD design; glow discharge plasma; interactive software system; linear constrained optimization model; linear inequality; low-pressure plasma sputtering; physical vapor deposition system; rotating magnetron; Magnetic confinement; Magnetic resonance imaging; Magnetic separation; Optimization; Sputtering; Substrates;
Conference_Titel :
American Control Conference (ACC), 2013
Conference_Location :
Washington, DC
Print_ISBN :
978-1-4799-0177-7
DOI :
10.1109/ACC.2013.6580885
