DocumentCode
633404
Title
Switching operation using 220nm thickness Si waveguides with ferroelectric liquid crystal
Author
Hayama, Y. ; Nonaka, Tomomi ; Kato, Akira ; Nakatsuhara, K. ; Nakagami, T.
Author_Institution
Dept. of Electr. & Electron. Eng., Kanagawa Inst. of Technol., Atsugi, Japan
fYear
2013
fDate
June 30 2013-July 4 2013
Firstpage
1
Lastpage
2
Abstract
Switching operations were demonstrated using 220nm thickness Si waveguides with ferro-electric liquid crystal cladding. The phase shift coefficient was evaluated from the switching characteristics to be 3.84 π rad/mm, which is higher than the conventional value.
Keywords
elemental semiconductors; ferroelectric devices; liquid crystal devices; optical switches; optical waveguides; silicon; Si; ferroelectric liquid crystal; optical waveguide; phase shift coefficient; size 220 nm; switching operation; Liquid waveguides; Optical device fabrication; Optical switches; Optical waveguides; Phase shifters; Refractive index; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
OptoElectronics and Communications Conference held jointly with 2013 International Conference on Photonics in Switching (OECC/PS), 2013 18th
Conference_Location
Kyoto
Type
conf
Filename
6597539
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