DocumentCode :
633569
Title :
Effects of a Kind of Palm Covering on Photosynthetic Characteristics of Chinese Pine Plantation
Author :
Ping, Liu ; Yutao, Wang
fYear :
2013
fDate :
29-30 June 2013
Firstpage :
534
Lastpage :
537
Abstract :
The photosynthetic parameters of Pinus tabulaeformis plantation were measured after covering forest land by palm mat for two growing seasons. The result indicates the daily maximum photosynthetic rate and the photosynthetic rate in the photosynthesis saturated point increased by 30% and 10.6%~44.3% respectively compared with the CK, the transpiration rate and stomatal conductance increased to some extent, while the light compensation point and the water use efficiency between the treatment and CK were no significant differences.
Keywords :
Automation; Manufacturing; Chinese pine plantation; Palm covering; Photosynthetic characteristics;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Digital Manufacturing and Automation (ICDMA), 2013 Fourth International Conference on
Conference_Location :
Shinan District of Qingdao ??Shangdong Province, China
Type :
conf
DOI :
10.1109/ICDMA.2013.126
Filename :
6598047
Link To Document :
بازگشت