DocumentCode :
633603
Title :
Physical Design and Verification for Embedded CPU under Deep Submicron Technology
Author :
Ran Fan ; Zheng Dandan
Author_Institution :
Inst. of VLSI Design, Zhejiang Univ., Hangzhou, China
fYear :
2013
fDate :
29-30 June 2013
Firstpage :
921
Lastpage :
924
Abstract :
To overcome the challenges brought by the scale down of feature size, a flow of physical design and verification for embedded CPU under deep submicron technology is put forward in this paper. New problems are encountered in timing closure, signal integrity, IR drop and antenna effect, so we must select the effective EDA tools and develop new flow of physical design and verification combining with the characteristics of circuit under deep submicron technology. New challenges are analyzed, especially the interconnect line effect, and how to prevent the crosstalk and ensure the timing performance has been discussed. The embedded CPU CK610 using 0.13um 1P4M CMOS process technology has been completed by this new flow and the result indicates this chip complies with all requirements.
Keywords :
CMOS integrated circuits; electronic design automation; logic design; CMOS process technology; EDA tool; IR drop; antenna effect; crosstalk; deep submicron technology; embedded CPU; interconnect line effect; signal integrity; size 0.13 micron; timing closure; Automation; Manufacturing; Deep Submicron; Embedded CPU; Physical Design; Verification;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Digital Manufacturing and Automation (ICDMA), 2013 Fourth International Conference on
Conference_Location :
Qingdao
Type :
conf
DOI :
10.1109/ICDMA.2013.217
Filename :
6598140
Link To Document :
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