DocumentCode
633894
Title
Failure analysis of P-N junction degradation by high temperature reverse bias operating condition
Author
SungSoon Choi ; Kwanhoon Lee
Author_Institution
Korea Electron. Technol. Inst., Seongnam, South Korea
fYear
2013
fDate
15-19 July 2013
Firstpage
587
Lastpage
590
Abstract
Failures of degradation of BJT(Bipolar Junction Transistor) are continuously and frequently reported. Most popular failure mechanism is electrical over stress including high voltage or high current. But unfortunately, most failure is not visible because of enclosing packaging. Furthermore decapsulation process is not perfectly free from damage problem during the handling. Consequently, electrical characteristic analysis for failure analysis is very important. In this work, BJT specimen which failed during HTRB(High Temperature Reverse Bias) test was analyzed through the electrical characteristic analysis.
Keywords
bipolar transistors; electronics packaging; failure analysis; high-temperature effects; p-n junctions; BJT; HTRB test; P-N junction degradation; bipolar junction transistor; electrical characteristic analysis; failure analysis; high temperature reverse bias operating condition; high temperature reverse bias test; Failure analysis; Integrated circuits;
fLanguage
English
Publisher
ieee
Conference_Titel
Physical and Failure Analysis of Integrated Circuits (IPFA), 2013 20th IEEE International Symposium on the
Conference_Location
Suzhou
ISSN
1946-1542
Print_ISBN
978-1-4799-1241-4
Type
conf
DOI
10.1109/IPFA.2013.6599229
Filename
6599229
Link To Document