• DocumentCode
    633894
  • Title

    Failure analysis of P-N junction degradation by high temperature reverse bias operating condition

  • Author

    SungSoon Choi ; Kwanhoon Lee

  • Author_Institution
    Korea Electron. Technol. Inst., Seongnam, South Korea
  • fYear
    2013
  • fDate
    15-19 July 2013
  • Firstpage
    587
  • Lastpage
    590
  • Abstract
    Failures of degradation of BJT(Bipolar Junction Transistor) are continuously and frequently reported. Most popular failure mechanism is electrical over stress including high voltage or high current. But unfortunately, most failure is not visible because of enclosing packaging. Furthermore decapsulation process is not perfectly free from damage problem during the handling. Consequently, electrical characteristic analysis for failure analysis is very important. In this work, BJT specimen which failed during HTRB(High Temperature Reverse Bias) test was analyzed through the electrical characteristic analysis.
  • Keywords
    bipolar transistors; electronics packaging; failure analysis; high-temperature effects; p-n junctions; BJT; HTRB test; P-N junction degradation; bipolar junction transistor; electrical characteristic analysis; failure analysis; high temperature reverse bias operating condition; high temperature reverse bias test; Failure analysis; Integrated circuits;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Physical and Failure Analysis of Integrated Circuits (IPFA), 2013 20th IEEE International Symposium on the
  • Conference_Location
    Suzhou
  • ISSN
    1946-1542
  • Print_ISBN
    978-1-4799-1241-4
  • Type

    conf

  • DOI
    10.1109/IPFA.2013.6599229
  • Filename
    6599229