DocumentCode :
633894
Title :
Failure analysis of P-N junction degradation by high temperature reverse bias operating condition
Author :
SungSoon Choi ; Kwanhoon Lee
Author_Institution :
Korea Electron. Technol. Inst., Seongnam, South Korea
fYear :
2013
fDate :
15-19 July 2013
Firstpage :
587
Lastpage :
590
Abstract :
Failures of degradation of BJT(Bipolar Junction Transistor) are continuously and frequently reported. Most popular failure mechanism is electrical over stress including high voltage or high current. But unfortunately, most failure is not visible because of enclosing packaging. Furthermore decapsulation process is not perfectly free from damage problem during the handling. Consequently, electrical characteristic analysis for failure analysis is very important. In this work, BJT specimen which failed during HTRB(High Temperature Reverse Bias) test was analyzed through the electrical characteristic analysis.
Keywords :
bipolar transistors; electronics packaging; failure analysis; high-temperature effects; p-n junctions; BJT; HTRB test; P-N junction degradation; bipolar junction transistor; electrical characteristic analysis; failure analysis; high temperature reverse bias operating condition; high temperature reverse bias test; Failure analysis; Integrated circuits;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Physical and Failure Analysis of Integrated Circuits (IPFA), 2013 20th IEEE International Symposium on the
Conference_Location :
Suzhou
ISSN :
1946-1542
Print_ISBN :
978-1-4799-1241-4
Type :
conf
DOI :
10.1109/IPFA.2013.6599229
Filename :
6599229
Link To Document :
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