DocumentCode
635689
Title
Study of the uniformity of 300mm wafer through ring- resonator analysis
Author
Chauveau, C. ; Labeye, P. ; Fedeli, J.-M. ; Blaize, S. ; Lerondel, G.
Author_Institution
CEA-Leti Minatec Campus, Grenoble, France
fYear
2012
fDate
11-14 Sept. 2012
Firstpage
1
Lastpage
3
Abstract
The uniformity of a 300mm wafer has been analyzed through the study of resonant wavelength of ring resonators. SOI thickness variation can be compensated with the use of Ti-TiN heater.
Keywords
integrated optics; optical resonators; silicon-on-insulator; titanium compounds; SOI thickness variation; Si; Ti-TiN; heater; resonant wavelength; ring-resonator analysis; size 300 mm; Heating; Optical device fabrication; Optical filters; Optical refraction; Optical ring resonators; Optical variables control; Optical waveguides;
fLanguage
English
Publisher
ieee
Conference_Titel
Photonics in Switching (PS), 2012 International Conference on
Conference_Location
Ajaccio
Electronic_ISBN
978-2-9123-2861-8
Type
conf
Filename
6608241
Link To Document