DocumentCode :
636788
Title :
A simple microfluidic gradient generator with a soft-lithographically prototyped, high-aspect-ratio, ∼2 µm wide microchannel
Author :
Ogawa, Tomomi ; Matsunaga, Nobutomo ; Inomata, Souichi ; Tanaka, Mitsuru ; Futai, Nobuyuki
Author_Institution :
Sch. of Med. & Dental Sci., Tokyo Med. & Dental Univ., Tokyo, Japan
fYear :
2013
fDate :
3-7 July 2013
Firstpage :
5521
Lastpage :
5524
Abstract :
We have developed a cast microfluidic chip that contains a thin (~2 μm wide) microchannel that is smoothly connected to thick microfluidics. The thin line features having high aspect ratio for a low-cost photolithography in which an emulsion photomask was used (1:1 ~ 1:3) were fabricated by exposing SU-8 photoresist to diffused 185 nm UV light emitted by a low-cost ozone lamp from the backside of the substrate to ensure sufficient crosslinking of small regions of the SU-8 photoresist. An H-shaped microfluidic configuration was used, in which the thin channel maintained constant diffusion fronts beyond purely static diffusion. We also demonstrated the long-term effects of a gradient of nerve growth factor on axon elongation by primary neurons cultured in the micro channel.
Keywords :
SU(8) theory; masks; microchannel flow; photoresists; soft lithography; SU-8 photoresist; crosslinking; high-aspect-ratio microchannel; long-term effects; microfluidic gradient generator; ozone lamp; photomask; soft-lithography; Apertures; Fabrication; Glass; Microchannel; Microfluidics; Nerve fibers; Resists;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Engineering in Medicine and Biology Society (EMBC), 2013 35th Annual International Conference of the IEEE
Conference_Location :
Osaka
ISSN :
1557-170X
Type :
conf
DOI :
10.1109/EMBC.2013.6610800
Filename :
6610800
Link To Document :
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