DocumentCode
638718
Title
Possibilities of blue laser-diode annealing as a new LTPS
Author
Noguchi, Takashi ; Okada, Takashi
Author_Institution
Fac. of Eng., Univ. of the Ryukyus, Okinawa, Japan
fYear
2013
fDate
2-5 July 2013
Firstpage
75
Lastpage
78
Abstract
Excimer laser annealing is currently used as a low temperature poly-Si (LTPS) for active matrix flat panel display on glass as the absorption in ultra-violet region for thin Si films is high to crystallize Si film efficiently. On the other hand, uniform heating of thin Si films can be realized by adopting semiconductor lasers in blue region at 445 nm, which enables to produce the various grain structures with keeping the Si surface smooth. The blue laser diode annealing (BLDA) is promising as an advanced LTPS for TFT systems on plastic as well as on glass panel.
Keywords
crystal microstructure; elemental semiconductors; excimer lasers; flat panel displays; laser beam annealing; semiconductor thin films; silicon; BLDA; LTPS; Si; TFT systems; blue laser-diode annealing; excimer laser annealing; flat panel display; grain structures; low temperature poly-Si; wavelength 445 nm; Annealing; Crystallization; Films; Glass; Laser modes; Power lasers; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Active-Matrix Flatpanel Displays and Devices (AM-FPD), 2013 Twentieth International Workshop on
Conference_Location
Kyoto
Type
conf
Filename
6617781
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