DocumentCode :
638738
Title :
Crystallography of excimer laser-crystallized In-Ga-Zn-O film
Author :
Shimomura, Akito ; Koyama, Masanori ; Ishiyama, Tomoaki ; Ohta, Masaya ; Tsubuku, Masashi ; Kikuchi, Erumu ; Hirohashi, Takuya ; Takahashi, Masaharu ; Yamazaki, Shumpei
Author_Institution :
Semicond. Energy Lab. Co., Ltd., Atsugi, Japan
fYear :
2013
fDate :
2-5 July 2013
Firstpage :
155
Lastpage :
158
Abstract :
It is found by nanobeam electron diffraction that the excimer laser crystallization of In-Ga-Zn-O films which are not c-axis-aligned can lead to formation of polycrystalline In-Ga-Zn-O thin films having spinel structures. The crystal structure of ZnInxGa2-xO4 in which Ga site of ZnGa2O4 is substituted by In was obtained by first-principle calculation. It has been revealed that the unitcell constants and out-of-plane XRD peak angles (2θ) which are calculated from electron diffraction are reproduced in x = 0.5-1. In contrast, in the case of performing laser crystallization on a CAAC-IGZO film as a precursor, although polycrystalline In-Ga-Zn-O thin films having homologous structures are formed, formation of spinel structures is not observed.
Keywords :
II-VI semiconductors; X-ray diffraction; ab initio calculations; crystallisation; electron diffraction; gallium compounds; indium compounds; semiconductor thin films; wide band gap semiconductors; zinc compounds; CAAC-IGZO film; InGaZnO; crystal structure; crystallography; excimer laser-crystallized film; first-principle calculation; homologous structure; nanobeam electron diffraction; out-of-plane XRD peak angles; polycrystalline thin films; spinel structure; unitcell constants; Crystals; Diffraction; Films; Lasers; Lattices; X-ray diffraction; X-ray scattering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Active-Matrix Flatpanel Displays and Devices (AM-FPD), 2013 Twentieth International Workshop on
Conference_Location :
Kyoto
Type :
conf
Filename :
6617803
Link To Document :
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