Title :
Crystallography of In-Ga-Zn-O thin film having CAAC structure
Author :
Ohgarane, Daisuke ; Konishi, M. ; Dairiki, Koji ; Oota, Masashi ; Hirohashi, Takuya ; Takahashi, Masaharu ; Tsubuku, Masashi ; Yamazaki, Shumpei ; Kanzaki, Yohsuke ; Matsukizono, Hiroshi ; Kaneko, Shin ; Mori, Shinsuke ; Matsuo, Takuya
Author_Institution :
Semicond. Energy Lab. Co., Ltd., Atsugi, Japan
Abstract :
We succeeded in fabricating an In-Ga-Zn-O (IGZO) thin film which has a novel structure. We have shown that the IGZO thin film has a c-axis aligned crystalline structure (abbreviated below to CAAC-IGZO) as the detailed structural analysis. Besides, we have shown that the crystalline plane of the CAAC-IGZO structure is c-axis aligned over the entire area in the nano-order analysis. In addition, the results have shown that a clear crystalline grain boundary was not observed regardless of the result that, over the entire area of the CAAC-IGZO thin film is c-axis aligned and has high crystallinity and there is no orientation on average in the directions of the a-axis and the b-axis. It is found that the CAAC-IGZO structure is a completely novel crystalline structure, which is different from a polycrystalline structure obtained by laser annealing, a nanocrystalline structure and an amorphous structure, which were previously reported in silicon TFT and so on.
Keywords :
II-VI semiconductors; gallium compounds; indium compounds; semiconductor growth; semiconductor thin films; wide band gap semiconductors; zinc compounds; CAAC structure; InGaZnO; c-axis aligned crystalline structure; crystalline plane; crystallography; nanoorder analysis; structural analysis; thin film; Diffraction; Films; Grain boundaries; Probes; Thin film transistors; X-ray diffraction;
Conference_Titel :
Active-Matrix Flatpanel Displays and Devices (AM-FPD), 2013 Twentieth International Workshop on
Conference_Location :
Kyoto