Lithography-aware 1-dimensional cell generation

As the process technology advances to the sub-wavelength era, the 1-dimensional (1-D) design style is regarded as one of the most effective ways to continue scaling down the minimum feature size. This paper presents the lithography-aware cell generation algorithms which simultaneously minimize 1-D cell area and enhance the printability. Experimental results show that the proposed algorithms can effectively and efficiently reduce the number of diffusion gaps, and minimize used routing tracks. Consequently, our approach results in smaller 1-D cell area and better printability.