DocumentCode :
649337
Title :
High current driving charge pumps in distributed biomedical implants using silicon-on-sapphire technology
Author :
Alex, Asish Zac ; Lehmann, T.
Author_Institution :
Sch. of Electr. Eng. & Telecommun., Univ. of New South Wales, Sydney, NSW, Australia
fYear :
2013
fDate :
4-7 Aug. 2013
Firstpage :
960
Lastpage :
963
Abstract :
This paper presents two highly efficient charge pump designs, one positive and one negative, used in a distributed bioimplant with completely integrated capacitors. The system is designed using silicon-on-sapphire (SOS) technology CMOS transistors to triple the voltage swing available at the chip-scale implant. The high power efficiency and high voltage conversion ratio of the system is obtained by selectively controlling the transistor switches in the current path to reduce the reverse current flow. The proposed charge pump design achieves a power efficiency of 83.3% and voltage conversion ratio of 0.95 for a 3 V, 2 MHz input signal and load of 2.5 mA. All performance simulations are done on cadence software customized by the Peregrine Semiconductor Corporation to implement SOS technology.
Keywords :
CMOS integrated circuits; capacitors; charge pump circuits; prosthetics; silicon-on-insulator; CMOS transistors; Cadence software; SOS technology; charge pump designs; chip-scale implant; current 2.5 mA; distributed bioimplant; distributed biomedical implants; frequency 2 MHz; integrated capacitors; power efficiency; reverse current flow; silicon-on-sapphire technology; transistor switches; voltage 3 V; voltage conversion ratio; voltage swing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Circuits and Systems (MWSCAS), 2013 IEEE 56th International Midwest Symposium on
Conference_Location :
Columbus, OH
ISSN :
1548-3746
Type :
conf
DOI :
10.1109/MWSCAS.2013.6674810
Filename :
6674810
Link To Document :
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