Title :
Controlling the density of CNTs by different underlayer materials in PECVD growth
Author :
Liang Xu ; Di Jiang ; Yifeng Fu ; Shantung Tu ; Johan Liu
Author_Institution :
Dept. of Microtechnol. & Nanosci. (MC2), Chalmers Univ. of Technol., Goteborg, Sweden
Abstract :
In this paper, we present a new approach of controlling the growth density of carbon nanotubes (CNTs) by controlling the thickness of Cu underlayer. Tested thicknesses of Cu range from 5nm to 150nm. In this work, we have tried two kinds of barrier layer material, namely Mo and Al2O3 against the diffusion of Ni catalysts. The results suggest Al2O3 is a better barrier layer material and more suitable than Mo to be applied with Cu underlayer for the controlling of growth density of CNTs. In the end, this paper also gives a tentative explanation of this new method of controlling CNT growth density by adjusting the thickness of Cu underlayer.
Keywords :
carbon nanotubes; catalysis; catalysts; diffusion; nanofabrication; plasma CVD; Al2O3; C; Mo; Ni catalysts; barrier layer material; carbon nanotubes; diffusion; growth density; plasma CVD; plasma enhanced chemical vapour deposition; size 5 nm to 150 nm; thickness testing; underlayer materials;
Conference_Titel :
Thermal Investigations of ICs and Systems (THERMINIC), 2013 19th International Workshop on
Conference_Location :
Berlin
Print_ISBN :
978-1-4799-2271-0
DOI :
10.1109/THERMINIC.2013.6675185
