• DocumentCode
    650122
  • Title

    Channel length influence on the analog characteristics of asymmetric self-cascode association of SOI transistors

  • Author

    de Souza, M. ; Flandre, Denis ; Pavanello, Marcelo Antonio

  • Author_Institution
    Electr. Eng. Dept., Centro Univ. da FEI, São Bernardo do Campo, Brazil
  • fYear
    2013
  • fDate
    2-6 Sept. 2013
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    This paper presents an experimental analysis of channel length influence on the analog characteristics of asymmetric self-cascode association of SOI transistors. It is shown that the increase of the drain current and transconductance is more pronounced with the reduction of the length of the transistor close to the source (L1), and, differently from the symmetric self-cascode, suffers little influence of the length close to the drain (L2). On the contrary, the output conductance of symmetric and asymmetric threshold voltage structures is benefited by the increase of L2 and L1, although the asymmetric structure may offer a reduction of up to one order of magnitude in comparison to the symmetric one. It results in larger intrinsic voltage drain for asymmetric devices. This increase has shown to reach more than 20 dB for similar dimensions, or allow for dimension reduction without intrinsic gain degradation.
  • Keywords
    silicon-on-insulator; transistors; SOI transistors; analog characteristics; asymmetric self cascode association; asymmetric threshold voltage structures; channel length influence; drain current; output conductance; reduction without intrinsic gain degradation; transconductance; Analog Parameters; Asymmetric Self-cascode; SOI MOSFET;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microelectronics Technology and Devices (SBMicro), 2013 Symposium on
  • Conference_Location
    Curitiba
  • Print_ISBN
    978-1-4799-0516-4
  • Type

    conf

  • DOI
    10.1109/SBMicro.2013.6676154
  • Filename
    6676154