DocumentCode :
650122
Title :
Channel length influence on the analog characteristics of asymmetric self-cascode association of SOI transistors
Author :
de Souza, M. ; Flandre, Denis ; Pavanello, Marcelo Antonio
Author_Institution :
Electr. Eng. Dept., Centro Univ. da FEI, São Bernardo do Campo, Brazil
fYear :
2013
fDate :
2-6 Sept. 2013
Firstpage :
1
Lastpage :
4
Abstract :
This paper presents an experimental analysis of channel length influence on the analog characteristics of asymmetric self-cascode association of SOI transistors. It is shown that the increase of the drain current and transconductance is more pronounced with the reduction of the length of the transistor close to the source (L1), and, differently from the symmetric self-cascode, suffers little influence of the length close to the drain (L2). On the contrary, the output conductance of symmetric and asymmetric threshold voltage structures is benefited by the increase of L2 and L1, although the asymmetric structure may offer a reduction of up to one order of magnitude in comparison to the symmetric one. It results in larger intrinsic voltage drain for asymmetric devices. This increase has shown to reach more than 20 dB for similar dimensions, or allow for dimension reduction without intrinsic gain degradation.
Keywords :
silicon-on-insulator; transistors; SOI transistors; analog characteristics; asymmetric self cascode association; asymmetric threshold voltage structures; channel length influence; drain current; output conductance; reduction without intrinsic gain degradation; transconductance; Analog Parameters; Asymmetric Self-cascode; SOI MOSFET;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microelectronics Technology and Devices (SBMicro), 2013 Symposium on
Conference_Location :
Curitiba
Print_ISBN :
978-1-4799-0516-4
Type :
conf
DOI :
10.1109/SBMicro.2013.6676154
Filename :
6676154
Link To Document :
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