Title :
Characteristics of dielectric barrier discharge microplasma
Author :
Blajan, Marius ; Shimizu, Kazuo
Author_Institution :
Shizuoka Univ., Hamamatsu, Japan
Abstract :
Emission spectroscopy analysis and imaging technique were used to study the microplasma phenomena. The microplasma discharge in Ar and N2/Ar was analyzed along the discharge gap area and also for specific periods of time during the discharge. Spatial and temporal distribution showed the propagation of light emission from anode towards cathode. The phenomena could be divided in stages: electron avalanche from cathode and the anode, cathode direct streamer development, cathode layer development, cathode layer enhancement and final stage of cathode layer decay. The light emission was measured up to 365 ns as long as the discharge current was measured. The peak of Ar I at 696.5 nm was used to estimate the electron density using Stark broadening method. The calculated value of electron density ne= 1014/cm3 is specific for atmospheric pressure nonthermal plasmas.
Keywords :
Stark effect; anodes; argon; cathodes; dielectric-barrier discharges; electron avalanches; nitrogen; plasma density; plasma diagnostics; plasma light propagation; spectral line broadening; Ar; Ar-N2; N2-Ar mixture; Stark broadening method; anode direct streamer development; atmospheric pressure nonthermal plasmas; cathode direct streamer development; cathode layer decay; cathode layer development; cathode layer enhancement; dielectric barrier discharge microplasma; discharge current; discharge gap area; electron avalanche; electron density; emission spectroscopy analysis; imaging technique; light emission; pressure 1 atm; spatial distribution; temporal distribution; wavelength 696.5 nm; Atmospheric measurements; Cathodes; Density measurement; Emissions; Oscilloscopes; Pulse power systems; Spectroscopy; Streaming media; Stark broadening method; dielectric barrier discharge; emission spectroscopy; microplasma;
Conference_Titel :
Industry Applications Society Annual Meeting, 2013 IEEE
Conference_Location :
Lake Buena Vista, FL
DOI :
10.1109/IAS.2013.6682462