DocumentCode :
65624
Title :
A Geometry Scalable Model for Nonlinear Thermal Impedance of Trench Isolated HBTs
Author :
Sahoo, Abhaya Kumar ; Fregonese, Sebastien ; Desposito, Rosario ; Aufinger, Klaus ; Maneux, Cristell ; Zimmer, T.
Author_Institution :
IMS Lab., Univ. of Bordeaux, Bordeaux, France
Volume :
36
Issue :
1
fYear :
2015
fDate :
Jan. 2015
Firstpage :
56
Lastpage :
58
Abstract :
This letter presents a geometry scalable approach for the calculation of temperature dependent thermal impedance (ZTH) in trench-isolated heterojunction bipolar transistors. The model is capable of predicting the ZTH at any desired temperature and bias points. The temperature dependency is derived by discretizing the heat flow region into n number of elementary slices depending on the thermal gradient. Temperature dependent thermal resistances Rths and capacitances Cths for each of the slices are calculated in a self-consistent manner. Finally, the proposed model is validated with low-frequency measurements at different ambient temperatures (Tamb) for different transistor geometries and found to be in good agreement.
Keywords :
geometry; heat transfer; heterojunction bipolar transistors; semiconductor device models; thermal resistance; bias points; elementary slices; geometry scalable model; heat flow region; low-frequency measurements; nonlinear thermal impedance; temperature dependent thermal impedance; temperature dependent thermal resistances; thermal gradient; trench isolated HBTs; trench-isolated heterojunction bipolar transistors; Diffusion tensor imaging; Frequency measurement; Geometry; Heating; Temperature dependence; Temperature measurement; Thermal resistance; Electrothermal effects; Heterojunction bipolar transistors; Semiconductor device measurements; Thermal impedance; electrothermal effects; semiconductor device measurements; thermal impedance;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2014.2375331
Filename :
6971102
Link To Document :
بازگشت