Title :
Layout-type dependence on ESD/LU reliabilities for LVTnSCR devices
Author :
Shen-Li Chen ; Chun-Ju Lin ; Min-Hua Lee ; Yi-Sheng Lai
Author_Institution :
Dept. of Electron. Eng., Nat. United Univ., Miaoli, Taiwan
Abstract :
This paper aimed at the study of layout dependence on ESD/LU reliabilities in the 0.35um 3.3V low-voltage triggered silicon-controlled-rectifier (LVTSCR) DUTs. In this work, the parameter of channel L in an nMOS, the parameter S of an SCR are varied to study the influence on trigger voltage (Vt1), holding voltage (Vh) and secondary breakdown current (It2). Eventually, it can be concluded that the layout illustration of type-2 has a higher It2 than that of type-1, i.e., the ratio of (It2)type-2/(It2)type-1 > 1.3 among all the LVTnSCRs. Meanwhile, the holding voltages of SCR devices are latch-up (LU) free while operated at 3.3V. Therefore, the type-2 layouts of SCR device are so excellent structure in the ESD/LU reliability considerations for power management applications.
Keywords :
electrostatic discharge; integrated circuit layout; integrated circuit reliability; low-power electronics; thyristors; ESD-LU reliability; LVTSCR DUT; LVTnSCR devices; holding voltage; latch-up free; layout-type dependence; low-voltage triggered silicon-controlled-rectifier; nMOS; power management; secondary breakdown current; size 0.35 mum; trigger voltage; type-2 layouts; voltage 3.3 V; DC-DC power converters; Leakage currents; MOS devices; Robustness; Standards; Thyristors;
Conference_Titel :
Future Energy Electronics Conference (IFEEC), 2013 1st International
Conference_Location :
Tainan
Print_ISBN :
978-1-4799-0071-8
DOI :
10.1109/IFEEC.2013.6687601