Realization and characterization methods for plasmonic structures in visible and infrared

We present the realization and characterization methods of plasmonic devices that operates in visible and infrared domains. We start with a short presentation on the criteria on which we select the appropriate materials and dimensions for this type of devices. After that, we present a series of characterization methods in order to investigate the surface of the structures, but also to capture the evanescent field that propagates on the metallic-dielectric interface. For experimental realization we will present results obtained by using Electron-beam deposition for patterning dielectric waveguide, and Electron-beam vaporization and sputtering for depositing the metallic thin film. For pattern configuration of the insulator waveguides, we utilized a RAITH e Line nanolithography equipment, with field-emission gun and gas injection system for Electron Beam Induced Deposition (EBID). In order to characterize the structures, we used a Scanning Electron Microscope (Tescan VEGA II LMU, general purpose SEM with thermionic emission electron gun) and for surface investigation we employed an Alpha 300 S system with SNOM (Scanning Near-field Optical Microscope) and AFM (Atomic Force Microscope) capabilities.