DocumentCode :
657251
Title :
Proposal of shear stress sensor based on optical detection
Author :
Eto, Y. ; Shibata, Satoshi ; Shikida, Mitsuhiro
Author_Institution :
Dept. of Mech. Sci. Eng., Nagoya Univ., Nagoya, Japan
fYear :
2013
fDate :
3-6 Nov. 2013
Firstpage :
1
Lastpage :
4
Abstract :
A shear stress sensor based on an optical detection is proposed. The sensor consists of the floating element and the optical 45-degree micro-mirror. It has advantages that it can detect the shear stress directly, and is not sensitive for the electrical noise. The mirror having 45 degree slope is successfully fabricated onto Si{110} surface by applying KOH anisotropic wet etching. The floating element is produced in device layer of SOI wafer, and movement of the element by applying the airflow is also confirmed.
Keywords :
elemental semiconductors; etching; microfabrication; micromirrors; microsensors; optical fabrication; optical noise; optical sensors; silicon; silicon-on-insulator; wetting; KOH anisotropic wet etching; SOI wafer; Si; airflow; electrical noise; floating element; optical 45-degree micro-mirror; optical detection; shear stress sensor; Fluids; Geometrical optics; Laser beams; Mirrors; Optical device fabrication; Optical sensors; Stress;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
SENSORS, 2013 IEEE
Conference_Location :
Baltimore, MD
ISSN :
1930-0395
Type :
conf
DOI :
10.1109/ICSENS.2013.6688537
Filename :
6688537
Link To Document :
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