Title :
UV-sensitive low dark-count PureB single-photon avalanche diode
Author :
Lin Qi ; Mok, K.R.C. ; Charbon, E. ; Nanver, Lis K. ; Aminian, M. ; Charbon, E.
Author_Institution :
Dept. of Microelectron., Delft Univ. of Technol., Delft, Netherlands
Abstract :
A single-photon avalanche diode (SPAD) with high responsivity in the ultraviolet (UV) wavelength range has been fabricated on Si using PureB (Pure Boron) chemical-vapor deposition to create both a nanometer-thin anode junction and robust light entrance window. The device shows high responsivity at the wavelength of 330 nm and 370 nm when operating in Geiger mode. The dark count rates (DCR) can be as low as 5 Hz at room temperature for an active area of 7 μm2. An implicit guard ring, using an n-enhancement implantation in the central region of the diode, is applied instead of peripheral diffused p-type guard rings to achieve a high fill-factor.
Keywords :
CVD coatings; avalanche photodiodes; boron; nanoelectronics; semiconductor doping; silicon; Geiger mode; PureB technology; SPAD; Si:B; UV sensitive avalanche diode; chemical vapor deposition; low dark count avalanche diode; n-enhancement implantation; nanometer thin anode junction; robust light entrance window; single photon avalanche diode; ultraviolet wavelength range; wavelength 330 nm; wavelength 370 nm; Anodes; Electric breakdown; Junctions; Photodiodes; Photonics; Semiconductor diodes; Silicon;
Conference_Titel :
SENSORS, 2013 IEEE
Conference_Location :
Baltimore, MD
DOI :
10.1109/ICSENS.2013.6688603