• DocumentCode
    658
  • Title

    Dynamic Modeling of Dual Speed Ferroelectric and Charge Hybrid Memory

  • Author

    Rajwade, Shantanu R. ; Auluck, Kshitij ; Naoi, Taro A. ; Jayant, Krishna ; Kan, Edwin C.

  • Author_Institution
    Sch. of Electr. & Comput. Eng., Cornell Univ., Ithaca, NY, USA
  • Volume
    60
  • Issue
    10
  • fYear
    2013
  • fDate
    Oct. 2013
  • Firstpage
    3378
  • Lastpage
    3384
  • Abstract
    This paper presents a physical model for program and retention transients in ferroelectric (FE) and charge hybrid nonvolatile memory. A region-by-region statistical model for domain switching in polycrystalline FEs was incorporated with the tunneling current simulations to predict the memory window (AVTH) evolution during program and retention operations. The simulations validated the two-step program mechanism experimentally observed in such memories: rapid initial domain switching on account of high fields in the FE layer followed by field enhancement in the tunneling dielectric which initiates electron injection into the storage nodes. Further, these simulations were shown to accurately account for individual ΔVTH from the two additive memory mechanisms at all program times. The depolarization effect was shown to be dominant for ΔVTH loss at short and moderate retention time scales (<;100 s). This model was further used to provide realistic estimates in achieving dual speed program and the corresponding dual mode retention characteristics akin to a DRAM and flash hybrid operation.
  • Keywords
    dielectric materials; ferroelectric storage; random-access storage; DRAM; charge hybrid nonvolatile memory; depolarization effect; dual mode retention characteristics; dual speed ferroelectric memory; dynamic modeling; electron injection; field enhancement; flash hybrid operation; memory window evolution; polycrystalline FE; program times; program transients; rapid initial domain switching; region-by-region statistical model; retention time scales; retention transients; storage nodes; tunneling current simulations; tunneling dielectric; two-step program mechanism; Ash; Iron; Logic gates; Random access memory; Switches; Transient analysis; Tunneling; DRAM flash; ferroelectric (FE) switching; hybrid memory; modeling;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2013.2279259
  • Filename
    6589996