DocumentCode :
66056
Title :
New Assessment Methodology Based on Energy–Delay–Yield Cooptimization for Nanoscale CMOS Technology
Author :
Xiaobo Jiang ; Junyao Wang ; Xingsheng Wang ; Runsheng Wang ; Binjie Cheng ; Asenov, Asen ; Lan Wei ; Ru Huang
Author_Institution :
Key Lab. of Microelectron. Devices & Circuits, Peking Univ., Beijing, China
Volume :
62
Issue :
6
fYear :
2015
fDate :
Jun-15
Firstpage :
1746
Lastpage :
1753
Abstract :
A new technology assessment methodology is proposed to simultaneously evaluate circuit-level energy, delay, and yield under realistic device operation theme through Monte Carlo analysis. Given any yield constraints, this new methodology can maximize the circuit energy efficiency without overdesign. It provides a method to quantify the tradeoff between energy-delay (ED) and yield. The proposed method is proved to be efficient especially for low power circuit applications compared with ED-only approach. Taking 14-nm FinFET design, for example, the impacts of major variation sources are analyzed for different circuit applications, showing a different trend from the ED-only approach. In addition, the methodology is also extended to include the impacts of reliability issues. A desired design strategy is found to balance the design merits and circuit reliability. The proposed methodology is helpful for technology assessment and early stage circuit design and planning.
Keywords :
CMOS integrated circuits; Monte Carlo methods; circuit optimisation; integrated circuit design; integrated circuit reliability; integrated circuit yield; low-power electronics; Monte Carlo analysis; circuit design; circuit energy efficiency; circuit reliability; energy-delay-yield cooptimization; low power circuit applications; nanoscale CMOS technology; CMOS integrated circuits; Circuit synthesis; Delays; FinFETs; Integrated circuit modeling; Optimization; Reliability; Delay; energy; optimization; reliability; variability; yield; yield.;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2015.2396575
Filename :
7042278
Link To Document :
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