• DocumentCode
    662689
  • Title

    Diamond bipolar device simulation

  • Author

    Marechal, A. ; Rouger, N. ; Crebier, Jean-Christophe ; Pernot, J. ; Koizumi, S. ; Teraji, T. ; Gheeraert, E.

  • Author_Institution
    Inst NEEL, Univ. Grenoble Alpes, Grenoble, France
  • fYear
    2013
  • fDate
    27-29 Oct. 2013
  • Firstpage
    151
  • Lastpage
    154
  • Abstract
    Diamond is not only known for being the hardest gemstone but also for being the semiconductor having the highest calculated figures of merit (FOM). This comes from the unique physical properties of this material. Thus, it is predicted that diamond should exceeds silicon carbide (SiC) and galium nitride (GaN) in terms of low loss device and better compromises for on-state resistance versus breakdown voltage. However, in practice the applications of diamond devices are still limited and the performances are still not reaching the theoretical predictions. The question is then how to predict and evaluate diamond device performances themselves and in their environment. One of the possible answer is by using finite element based softwares. Few reports exist on unipolar diamond device modeling, and none on diamond bipolar device. The main limitations come from the lack of parameters implemented in the simulation tools together with the difficulties for modeling wide band gap semiconductor, i.e. extremely low carrier concentrations. In this study, we present the results on the first simulation of a diamond bipolar junction transistor electrical characteristics. The validation of the simulation is the first step towards the prediction of the architecture and behavior of future diamond devices.
  • Keywords
    bipolar transistors; diamond; elemental semiconductors; semiconductor device models; wide band gap semiconductors; C; carrier concentrations; diamond bipolar device simulation; diamond bipolar junction transistor electrical characteristics; finite element based softwares; simulation tools; wide band gap semiconductor; Diamonds; Erbium; Gallium nitride; Performance evaluation; Semiconductor process modeling; Silicon; Thickness measurement; Numerical simulation; TCAD software; diamond bipolar device;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Wide Bandgap Power Devices and Applications (WiPDA), 2013 IEEE Workshop on
  • Conference_Location
    Columbus, OH
  • Type

    conf

  • DOI
    10.1109/WiPDA.2013.6695584
  • Filename
    6695584