Simple process for single-layer nanowire gratings

A simple fabrication process for single-layer nanowire gratings (SLNGs) is proposed. On the basis of this process, an SLNG polariser with a 1.3 × 1.3 mm area of grating patterns and a 100 nm linewidth was successfully fabricated. First, the nanograting patterns were transferred from a metal master stamp to a soft IPS mould using the hot embossing process and the nanograting patterns on the IPS mould were transferred to the imprint resist layer by UV nanoimprint process subsequently; then, after a residual resist removal process, an aluminium layer was thermally evaporated on the substrate to form a bilayer nanowire grating structure; and finally, SLNGs were fabricated by an oxygen plasma ashing process. The inspection results show good consistency in the whole grating patterns area. The experimental result demonstrates that the proposed simple process can be adaptable to fabrications of high-density and large-area nanometal patterns.