Title :
UHF quartz MEMS oscillators for dynamics-based system enhancements
Author :
Kubena, R.L. ; Kirby, D.J. ; Yook-Kong Yong ; Chang, D.T. ; Stratton, F.P. ; Nguyen, Hieu D. ; Joyce, R.J. ; Perahia, Raviv ; Moyer, H.P. ; Nagele, R.G.
Author_Institution :
HRL Labs., LLC, Malibu, CA, USA
Abstract :
Processes for fabricating full wafers of UHF quartz MEMS oscillators bonded to Si have been developed at HRL over the past several years. These devices have shown state-of-the-art noise and stability along with extremely small vacuum packaged die size of less than 3 mm. An interesting by-product of the high frequency, small size, and wafer-scale fabrication of these devices is that several novel dynamics-based enhancements can be considered. These include the use of nonlinear dynamics for reducing oscillator phase noise at CMOS capable voltages and co-integration with more complex structures for sensing vibration and serving as a local timing reference for reducing thermally-induced sensor drifts. Several of these novel concepts made possible by wafer-scale MEMS-based processing will be reviewed.
Keywords :
CMOS analogue integrated circuits; UHF oscillators; crystal oscillators; microsensors; phase noise; vibration measurement; wafer-scale integration; CMOS; UHF quartz MEMS oscillators; dynamics-based system enhancements; local timing reference; nonlinear dynamics; oscillator phase noise reduction; thermally-induced sensor drifts; vibration sensing; wafer-scale MEMS-based processing; Admittance; Mathematical model; Micromechanical devices; Phase noise; Resonant frequency; Silicon; Quartz MEMS; Si Disk Resonator Gyro; duffing; force rebalance; frequency locking; nonlinear operation; ovenization; phase noise; vibration compensation;
Conference_Titel :
European Frequency and Time Forum & International Frequency Control Symposium (EFTF/IFC), 2013 Joint
Conference_Location :
Prague
DOI :
10.1109/EFTF-IFC.2013.6702066