• DocumentCode
    667927
  • Title

    Dynamics of microscale thin film AlN piezoelectric resonators enables low phase noise UHF frequency sources

  • Author

    Piazza, Gianluca ; Tazzoli, Augusto ; Miller, Nate ; Segovia, Jeronimo ; Cassella, Cristian ; Koo, Jonghoe ; Otis, Brian ; McNaul, Kamala ; Gibson, B. ; Turner, Kimberly ; Palmer, Todd

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Carnegie Mellon Univ., Pittsburgh, PA, USA
  • fYear
    2013
  • fDate
    21-25 July 2013
  • Firstpage
    555
  • Lastpage
    558
  • Abstract
    Miniaturized, multi-band and high frequency oscillators that are compatible with CMOS processes are highly desirable for the synthesis of compact, stable, and low power frequency sources for reconfigurable radio frequency communication systems and cognitive radios. Aluminum nitride (AlN) contour mode MEMS resonators (CMR) are emerging devices capable of high Q, low impedance, and multi-frequency operation on a single chip. The frequency stability of these AlN MEMS devices is of primary importance in delivering oscillators that exhibit low phase noise, and low sensitivity to temperature and acceleration. In this article we describe how the resonator dynamics impacts oscillator performance and present some preliminary demonstrations of ultra-high-frequency (UHF) oscillators. An example of an oscillator prototype we synthesized with a 586 MHz AlN CMR exhibited phase noise <; - 91 dBc/Hz and - 160 dBc/Hz at 1 kHz and 10 MHz offsets, temperature stability of 2 ppm from - 20 to + 85°C, and acceleration sensitivity <; 30 ppb/G.
  • Keywords
    III-V semiconductors; UHF oscillators; aluminium compounds; crystal resonators; micromechanical resonators; phase noise; wide band gap semiconductors; AlN; UHF frequency sources; acceleration sensitivity; aluminum nitride contour mode MEMS resonators; frequency 586 MHz; low phase noise; microscale thin film AlN piezoelectric resonators; oscillator performance; temperature -20 degC to 85 degC; temperature stability; ultra-high-frequency oscillators; III-V semiconductor materials; Micromechanical devices; Optical resonators; Phase noise; Resonant frequency; Oscillator; aluminum nitride; non-linear oscillator; nonlinear dynamics; phase nosie; piezoelectric resonator;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    European Frequency and Time Forum & International Frequency Control Symposium (EFTF/IFC), 2013 Joint
  • Conference_Location
    Prague
  • Type

    conf

  • DOI
    10.1109/EFTF-IFC.2013.6702291
  • Filename
    6702291