DocumentCode
671143
Title
Ni80 Fe20 V-shaped magnetic core for high performance MEMS sensors and actuators
Author
Abidin, Ummikalsom ; Majlis, Burhanuddin Yeop ; Yunas, Jumril
Author_Institution
Inst. of Microeng. & Nanoelectron. (IMEN), Univ. Kebangsaan Malaysia (UKM), Bangi, Malaysia
fYear
2013
fDate
25-27 Sept. 2013
Firstpage
66
Lastpage
69
Abstract
Development of integrated ferromagnetic materials structure as magnetic core is crucial for high performance MEMS sensors and actuators. A core structure is able to improve the magnetic flux linkage and concentrate the magnetic flux density in the magnetic device resulting high magnetic field generation. Previous research has utilized various ferromagnetic materials of different structures embedded into the silicon substrate as MEMS magnetic core. This paper presents fabrication of V-shaped magnetic core by anisotropic wet etching of 30 percent potassium hydroxide (KOH) at 75 °C to produce V-shaped silicon cavity structure. Filling process of Permalloy (Ni80Fe20) into the cavity is done by DC electroplating technique. Low current density of 10 mA/cm2 is used to electrodeposit Ni80Fe20 magnetic film in this study. Saccharin addition into the electrolyte composition produced a bright and crack free structure as internal stress in the electrodeposited film is reduced. This effect is essential to have good magnetic properties of the magnetic core. Thicker structure of electroplated Ni80Fe20 is observed at the sharp edges of the V-shaped cavity tip. The reason of this effect to happen is because high current flux density occurrence at those edges. From this work, fabrication of V-shaped Ni80Fe20 magnetic core has been successfully demonstrated. This magnetic core is expected to give superior magnetic performance for on chip MEMS device applications.
Keywords
Permalloy; electroplating; etching; ferromagnetic materials; internal stresses; magnetic cores; magnetic flux; magnetic thin films; microactuators; microsensors; DC electroplating technique; Ni80Fe20; Permalloy; V-shaped magnetic core; V-shaped silicon cavity structure; anisotropic wet etching; crack free structure; current flux density; electrodeposited film; electrolyte composition; filling process; high performance MEMS actuators; high performance MEMS sensors; integrated ferromagnetic materials structure; internal stress; magnetic device; magnetic field generation; magnetic film; magnetic flux density; magnetic flux linkage; potassium hydroxide; saccharin addition; temperature 75 degC; Cavity resonators; Etching; Magnetic cores; Magnetic flux; Metals; Micromechanical devices; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro and Nanoelectronics (RSM), 2013 IEEE Regional Symposium on
Conference_Location
Langkawi
Print_ISBN
978-1-4799-1181-3
Type
conf
DOI
10.1109/RSM.2013.6706474
Filename
6706474
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