• DocumentCode
    671152
  • Title

    Numerical investigation of channel width variation in junctionless transistors performance

  • Author

    Dehzangi, Abdollah ; Larki, Farhad ; Majlis, Burhanuddin Yeop ; Hamidon, Mohd Nizar ; Menon, P. Susthitha ; Jalar, A. ; Islam, Md Shariful ; Md Ali, Sawal Hamid

  • Author_Institution
    Inst. of Microeng. & Nanoelectron. (IMEN), Univ. Kebangsaan Malaysia, Bangi, Malaysia
  • fYear
    2013
  • fDate
    25-27 Sept. 2013
  • Firstpage
    101
  • Lastpage
    104
  • Abstract
    Double gate junctionless (DGJLT) transistor, as a pinch off device, was previously fabricated. In this letter, the impact of channel width variation on behaviour of the device is studied by means of 3D-TCAD simulation tool. In this matter, the transfer characteristics, energy band diagram (valence/conduction band) and normal electric field along the nanowire between the source and the drain are studied at pinch off state. By decreasing the nanowire width, the on current decreases. Threshold voltage also reduced by decreasing the wire width. The highest electric field occurs at off state and the normal component of the electric field is stronger for smaller channel width. At pinch off state, the energy band diagrams revealed that a potential barrier against the current flow was built in channel which the smallest width has higher potential barrier. The overall result agrees with the behaviour of the nanowire junctionless transistors.
  • Keywords
    conduction bands; insulated gate field effect transistors; nanowires; semiconductor device models; valence bands; 3D-TCAD simulation tool; channel width variation; conduction band; double gate junctionless transistor; energy band diagram; nanowire width; normal electric field; pinch off device; potential barrier; threshold voltage; transfer characteristics; valence band; Electric fields; Logic gates; Nanoscale devices; Semiconductor process modeling; Silicon; Threshold voltage; Transistors; Lateral gate Junctionless transistor; TCAD simulation; channel width effect; energy band diagram;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro and Nanoelectronics (RSM), 2013 IEEE Regional Symposium on
  • Conference_Location
    Langkawi
  • Print_ISBN
    978-1-4799-1181-3
  • Type

    conf

  • DOI
    10.1109/RSM.2013.6706483
  • Filename
    6706483