• DocumentCode
    671243
  • Title

    Numerical study of side gate junction-less transistor in on state

  • Author

    Dehzangi, Abdollah ; Larki, Farhad ; Majlis, Burhanuddin Yeop ; Hamidon, Mohd Nizar ; Navasery, Manizheh ; Gharibshahi, Elham ; Khalilzadeh, Nasrin ; Vakilian, Mehdi ; Saion, Elias B.

  • Author_Institution
    Inst. of Microeng. & Nanoelectron. (IMEN), Univ. Kebangsaan Malaysia, Bangi, Malaysia
  • fYear
    2013
  • fDate
    25-27 Sept. 2013
  • Firstpage
    398
  • Lastpage
    401
  • Abstract
    Side gate p-type Junctionless Silicon transistor is fabricated by AFM nanolithography on low-doped (105 cm-3) SOI wafer. In this work, the simulation characteristic of the device using TCAD Sentaurus in on state will be studied. The results show that the device is the pinch off transistor, works in on state for zero gate voltage in depletion mode. Negative gate voltage drives the device into on state, but unable to make significant effect on drain current as accmulation mode. Simulation results for valence band energy, electric field and hole density are investigated along the active regions. The influence of the electric field due to the applied voltages of VDS and VG on charge distribution is much more when the device operates at the saturation region. The hole quasi-Fermi level has a positive slope showing the current flows from source to drain.
  • Keywords
    atomic force microscopy; field effect transistors; hole density; nanolithography; semiconductor device models; silicon-on-insulator; technology CAD (electronics); valence bands; AFM nanolithography; Si; TCAD Sentaurus; accmulation mode; depletion mode; drain current; electric field; hole density; hole quasiFermi level; low-doped SOI wafer; negative gate voltage; on state; pinch off transistor; side gate junction-less transistor; simulation characteristic; valence band energy; zero gate voltage; Doping; Electric fields; Logic gates; Nanoscale devices; Silicon; Simulation; Transistors; Side gate Junctionless Transistors (SGJLT); hole density distribution; valence band energy;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro and Nanoelectronics (RSM), 2013 IEEE Regional Symposium on
  • Conference_Location
    Langkawi
  • Print_ISBN
    978-1-4799-1181-3
  • Type

    conf

  • DOI
    10.1109/RSM.2013.6706575
  • Filename
    6706575