• DocumentCode
    671246
  • Title

    Double gate junctionless MOSFET simulation and comparison with analytical model

  • Author

    Guang-Ming Zhang ; Yi-Kai Su ; Hsin-Yi Hsin ; Yao-Tsung Tsai

  • Author_Institution
    Dept. of Electr. Eng., Nat. Central Univ., Jhongli, Taiwan
  • fYear
    2013
  • fDate
    25-27 Sept. 2013
  • Firstpage
    410
  • Lastpage
    413
  • Abstract
    This paper uses the C++ to develop an adapted band matrix solver to simulate the i-v curve and the drain current of the 2-D double-gate n-channel MOSFET, including different doping concentrations which from 5×10 (cm-3) to 5×10 (cm-3) and channel thickness which from 5 nm to 15 nm. And it discusses the threshold voltage from the i-vg curve and selects the more appropriate doping concentration and channel thickness to complete the following experiments. And then it simulates if-vg curve to determine threshold voltage which can present the channel on-off situation and calculates drain current which is in different gate voltage. It also can simulate the electric potential of the x-axis and y-axis. In the figure of the electric potential we can obtain the depletion width. It also analyzes the subthreshold, the linear and the saturation region in i-v curve, and we can find out the values of sub-threshold swing in the subthreshold region of the i-v curve and the value of the drain current in the saturation region of the i-v curve. It compares the results with the other reference papers. Finally, the equations of the threshold voltage can be developed, and we calculate the threshold voltage of double-gate n-channel MOSFET. The result obtained by the equation of the threshold voltage will be compared with result by 2-D simulation. The depletion width can be obtained as an analytical equation. The analytical depletion width can be verified by the figure of the x-axis and y-axis electric potential from 2-D simulation. The 2-D simulation also verifies the result with the drain current equation which is obtained by Pois-son´s equation. For circuit application, an inverter including a double-gate n-channel MOSFET and a 100kΩ resistor will be used to simulate the vo-vi characteristics and analyzes the parameters of the inverter (e.g. VOh, VOl, Vih, Vil, VS), and the noise margin (e.g. NML, NMH) will be calculated in order to determine the inverter´s performance and quality.
  • Keywords
    C++ language; MOSFET; doping profiles; electric potential; electronic engineering computing; invertors; resistors; semiconductor device models; semiconductor doping; 2-D double-gate n-channel MOSFET; C++; Poisson equation; adapted band matrix solver; analytical model; channel thickness; depletion width; doping concentrations; double gate junctionless MOSFET simulation; drain current; electric potential; i-v curve; resistance 100 kohm; resistor; size 5 nm to 15 nm; threshold voltage; Doping; Electric potential; Equations; Logic gates; MOSFET; Mathematical model; Threshold voltage; C++; Double gate; Junctionless MOSFET; MOSFET; semiconductor simulation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro and Nanoelectronics (RSM), 2013 IEEE Regional Symposium on
  • Conference_Location
    Langkawi
  • Print_ISBN
    978-1-4799-1181-3
  • Type

    conf

  • DOI
    10.1109/RSM.2013.6706578
  • Filename
    6706578