• DocumentCode
    672127
  • Title

    Sulfur-assisted growth of silicon nanowires using the VLS method

  • Author

    Ishiyama, Tomoaki ; Nakagawa, Sachiko ; Ishii, Y. ; Fukuda, Motohisa

  • Author_Institution
    Dept. of Electr. & Electron. Inf. Eng., Toyohashi Univ. of Technol., Toyohashi, Japan
  • fYear
    2013
  • fDate
    6-9 Oct. 2013
  • Firstpage
    35
  • Lastpage
    38
  • Abstract
    The synthesis of single-crystal silicon (Si) nanowires by a metal-catalyst-free vapor-liquid-solid (VLS) process has been studied. Si nanowires have been successfully synthesized by a simple thermal treatment without using a metal catalyst, while well-aligned nanowires have been grown by the conventional Au-catalytic VLS process. It is thought that sulfur, rather than metals, plays an important role in this synthesis technique, which is distinct from the conventional metal-catalytic VLS process. For the case without metal catalysts, single-crystal Si nanowires are grown by a VLS process in which the silicon sulfides produced by a reaction between Si and sulfur act as both molten eutectic alloy droplets and the source gases for nanowire growth. Structural characterizations of the nanowires were performed using scanning electron microscopy (SEM) and X-ray diffraction (XRD). The XRD measurements showed that the single crystal nanowires on a (111)-oriented Si substrate were preferentially oriented in a <;111> growth direction.
  • Keywords
    X-ray diffraction; catalysis; catalysts; drops; elemental semiconductors; nanofabrication; nanowires; scanning electron microscopy; semiconductor growth; silicon; (111)-oriented substrate; Au-catalytic VLS process; SEM; Si; X-ray diffraction; XRD; metal-catalyst-free vapor-liquid-solid process; molten eutectic alloy droplets; scanning electron microscopy; single-crystalline silicon nanowires; structural characterizations; sulfur-assisted growth; thermal treatment; Facsimile; Metals; Nanoscale devices; Silicon; Solvents;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology Materials and Devices Conference (NMDC), 2013 IEEE 8th
  • Conference_Location
    Tainan
  • Print_ISBN
    978-1-4799-3386-0
  • Type

    conf

  • DOI
    10.1109/NMDC.2013.6707475
  • Filename
    6707475